Gold plating technology for semiconductor wiring

Feature

  • Excellent thickness uniformity (Especially when different wiring widths are mixed)
  • Excellent wiring top flatness
  • Excellent via-hole formability (Deposition characteristic controllable)
  • Available to reduced surface roughness
  • Reduced damage to resists
  • Low plating temperature

Application example

Example of Electrolytic Au Plating Wiring Fabrication

Example of Excellent Au Plating Thickness Uniformity


L/S=5μm/5μm
(5μm thickness)


L/S/L=50μm/5μm/5μm
(5μm thickness)

Example of Reduced Surface Roughness


Surface roughness: Ra < 30nm

Example of Excellent Via-Hole Formability


Conformal Via-Hole


Filled Via-Hole